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In-situ spectroscopic ellipsometry and plasma control for large-scale magnetron sputter deposition processes

 
: Vergöhl, M.; Malkomes, N.; Matthée, T.; Bräuer, G.

Society of Vacuum Coaters -SVC-, Albuquerque/NM:
Society of Vacuum Coaters. 43rd Annual Technical Conference 2000. Proceedings : April 15-20, 2000, Denver, Colorado
Albuquerque: SVC, 2000
ISSN: 0737-5921
S.11-16
Society of Vacuum Coaters (Annual Technical Conference) <43, 2000, Denver/Colo.>
Englisch
Konferenzbeitrag
Fraunhofer IST ()
reactive magnetron sputtering; large area coating; in-situ ellipsometry; process control

Abstract
Different plasma control systems are applied for the stabilization of the reactive magnetron sputter process within the transition mode with power densities of up to 6 W/cm². Ex-situ spectroscopic ellipsometry and spectral photometry are used for analyzing low-e coatings on glass. Ex-situ/in-line ellipsometry on a large area coater was applied to monitor the film thicknesses of completed low-e coatings on moving substrates. A new optical measurement system is presented which was applied for in-situ/in-line spectroscopic ellipsometry. The thickness of different low-e coatings were monitored during the deposition process. Process drift as well as product changes were monitored with the setup.

: http://publica.fraunhofer.de/dokumente/N-2642.html