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2000
Conference Paper
Titel
In-situ spectroscopic ellipsometry and plasma control for large-scale magnetron sputter deposition processes
Abstract
Different plasma control systems are applied for the stabilization of the reactive magnetron sputter process within the transition mode with power densities of up to 6 W/cm². Ex-situ spectroscopic ellipsometry and spectral photometry are used for analyzing low-e coatings on glass. Ex-situ/in-line ellipsometry on a large area coater was applied to monitor the film thicknesses of completed low-e coatings on moving substrates. A new optical measurement system is presented which was applied for in-situ/in-line spectroscopic ellipsometry. The thickness of different low-e coatings were monitored during the deposition process. Process drift as well as product changes were monitored with the setup.