Options
2004
Conference Paper
Titel
Production of MF and DC-pulse sputtered precision optical interference coatings using a large area in-line coater
Abstract
This work focuses on the problem of producing antistatic and antireflective coatings (ARAS) based on TiO2-SiO2 layer stacks and single ITO layer with an in-line sputter system. The main problem observed using a Leybold A700V with PK750 cathodes for the deposition on 30 x 30 cm2 substrates was the insufficient reproducibility. In order to overcome these problems, we study the production of single and multilayer systems under different conditions and their changing material propterties. The determination of optical constance and independent layer thickness with variable angle spectroscopic ellipsometry (VASE) and photometry will be discussed. Also XRR measurements were carried out. With this information, a redesign of stacks necessary due to thickness deviations of the already deposited layers can be performed. Approaches to minimize the drawbacks of depositing optical coatings in in-line systems are shown.
Language
English