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Electron-beam lithography data preparation based on multithreading MGS/PROXECCO

 
: Eichhorn, H.; Lemke, M.; Gramss, J.; Bürger, B.; Bätz, U.; Belic, N.; Eisenmann, H.

Behringer, U. ; VDE/VDI-Gesellschaft Mikroelektronik, Mikro- und Feinwerktechnik -GMM-:
EMC 2000, 17th European Mask Conference on Mask Technology for Integrated Circuits and Micro-Components : lectures held at the GMM-Conference, Nov. 13-14, 2000 in Munich-Unterhaching, Germany
Berlin: VDE-Verlag, 2000 (GMM-Fachbericht 32)
ISBN: 3-8007-2587-8
S.157-162
European Conference on Mask Technology for Integrated Circuits and Micro-Components <17, 2000, München>
Englisch
Konferenzbeitrag
Fraunhofer IMS, Außenstelle Dresden ( IPMS) ()
data preparation; e-beam; proximity effect correction; MGS; PROXECCO; multithreading; Leica ZBA

Abstract
This paper will highlight an anhanced MGS layout data post processor and the results of its industrial application.
Besides the preparation of hierarchical GDS layout data, the processing of flat data has been drastically accelerated. The application of the Proximity Correction in conjunction with the OEM version of the PROXECCO was crowned with success for data preparation of mask sets featuring 0.25µm / 0.18µm integration levels.
In the examples cited in this paper, up to 64 dose levels are utilized per writing pass. From the input data the software can automatically select the parameters for the internal algorithms. This allows an easy use of the software package.
The multithreading capability of the MGS / PROXECCO is demonstrated by comparing the computing times with 4, 8, and 14 CPUs running on SUN Enterprise computers.

: http://publica.fraunhofer.de/dokumente/N-2593.html