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Process stabilisation for large area reactive MF-sputtering of Al-doped ZnO

 
: Ruske, F.; Pflug, A.; Sittinger, V.; Werner, W.; Szyszka, B.

Puetz, J. ; Leibniz-Institut für Neue Materialien gGmbH -INM-, Saarbrücken:
Advanced coatings on glass & plastics for large-area or high-volume products : Proceedings of the 5th International Conference on Coatings on Glass, ICCG 5, July 4 - 8, 2004, Congress Hall, Saarbruecken, Germany
Saarbrücken: INM, 2004
S.125-128
International Conference on Coatings on Glass (ICCG) <5, 2004, Saarbrücken>
Englisch
Konferenzbeitrag
Fraunhofer IST ()
process control; sputtering; AZO

Abstract
A control system for improving the homogeneity of oxide films deposited by reactive magnetron sputtering has been set up the in-line coater A700V at Fraunhofer IST. The control system monitors operating points along the largest length and thus prevents deviations from setpoints and switching of local target states into metallic or oxide mode. Pressure distributions calculated from a gas flow Monte Carlo simulation are used to calibrate setpoints and results of a simulation software for reactive magnetron sputtering in real coaters are compared to experiment.

: http://publica.fraunhofer.de/dokumente/N-25928.html