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2000
Conference Paper
Titel
Spectral-sensitive on-chip masking of Si-PIN-diodes using patterned and self-blocked optical coatings
Abstract
The manufacturing processes for spectral-sensitive on-chip masking of Si-PIN-diodes using thin-film optical filters are described. As two examples, a diode array with red, green, and blue filters (RGB) and a UV-sensitive diode are explained in detail. The RGB-filters are made of TiO$-2$/SiO$-2$ thin-films and the UV-filter is a metal/dielectric multilayer using HfO2, SiO2, and Al thin-films. Both filter types are self-blocked over a wavelength range from 200 to 1100nm. The optical coatings on the diodes are arranged as pixels with rhombic or rectangular shapes and with a later dimensions of about 20 microns as minimum. The used lift-off technique for patterning the coatings is described briefly. Reactive e-beam evaporation with ion-assistance is used to deposit the optical coatings.