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DUV/VUV light scattering measurement of optical components for lithography applications

: Gliech, S.; Steinert, J.; Flemming, M.; Duparre, A.


Al-Jumaily, G.A.; Duparre, A.; Singh, B. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries
Bellingham/Wash.: SPIE, 2000 (SPIE Proceedings Series 4099)
ISBN: 0-8194-3744-1
Conference "Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries" <2000, San Diego/Calif.>
Fraunhofer IOF ()
light scattering; UV coating

This paper reports on an instrument designed to measure the total backward and forward scattering of optical components down to the DUV/VUV spectral region. The system is based on a Coblentz sphere imaging the light scattered into the backward or forward hemispheres within an angular range from 2° to 85° onto the detector according to ISO/DIS 13696. The equipment divides into two set-ups, one operating in air at several wavelengths from 10.6 mum to 193 nm, the other one working in vacuum/ nitrogen at 157 nm and 193 nm. The system is fully automated and capable of scanning large sample areas. Both a deuterium lamp and an excimer laser can be used as radiation sources at 193 nm and 157 nm.
Results of measurements on fluoride multilayer coatings and CaF2 substrates are presented.