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X-ray study of the roughness of surfaces and interfaces

: Kozhevnikov, I.V.; Asadchikov, V.E.; Bukreeva, I.N.; Duparre, A.

Al-Jumaily, G.A.; Duparre, A.; Singh, B. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries
Bellingham/Wash.: SPIE, 2000 (SPIE Proceedings Series 4099)
ISBN: 0-8194-3744-1
Conference "Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries" <2000, San Diego/Calif.>
Fraunhofer IOF ()
roughness; x-ray scattering; atomic force microscopy; thin film; multilayer structure

The potentialities of the x-ray scattering method (XRS) for quantitative testing of supersmooth surfaces, thin films, and multilayer structures are discussed. The results of the surface roughness study with the use of XRS technique in hard and soft x-ray spectral regions are compared with independent measurements of the roughness by atomic force microscopy (AFM). It is demonstrated that the results obtained by XRS and AFM are in a very good agreement in spite of different physical principles underlying the methods. XRS technique is applied for the roughness study of thin films which are used in applications for x-ray and LW optics. The XRS method is demonstrated to enable quantitative evaluation of PSD functions of both the film interfaces and the correlation between the substrate and film roughnesses. X-ray investigations of the correlation of the roughnesses of short-period multilayer structures are discussed as well. The use of the whispering g allery effect is demonstrated to extend the XRS method to control of the concave surface roughness.