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120 nm resolution and 55 nm structure size in STED-lithography

: Wollhofen, R.; Katzmann, J.; Hrelescu, C.; Jacak, J.; Klar, T.A.

Postprint (PDF; )

Optics Express 21 (2013), Nr.9, S.10831-10840
ISSN: 1094-4087
Zeitschriftenaufsatz, Elektronische Publikation
Fraunhofer IZFP, Institutsteil Dresden ( IKTS-MD) ()

Two-photon direct laser writing (DLW) lithography is limited in the achievable structure size as well as in structure resolution. Adding stimulated emission depletion (STED) to DLW allowed overcoming both restrictions. We now push both to new limits. Using visible light for two-photon DLW (780 nm) and STED (532 nm), we obtain lateral structure sizes of 55 nm, a Sparrow limit of around 100 nm and we present two clearly separated lines spaced only 120 nm apart. The photo-resist used in these experiments is a mixture of tri- and tetra-acrylates and 7-Diethylamino-3-thenoylcoumarin as a photo-starter which can be readily quenched via STED.