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Exotic highly ionized pulse plasma processes

: Bandorf, R.; Bräuer, G.

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IOP conference series. Materials science and engineering 39 (2012), Nr.1, Art. 012005, 9 S.
ISSN: 1757-8981
ISSN: 1757-899X
International Conference on High Power Impulse Magnetron Sputtering (HIPIMS) <2, 2011, Braunschweig>
Zeitschriftenaufsatz, Konferenzbeitrag, Elektronische Publikation
Fraunhofer IST ()

Highly ionized pulse plasma processes (HIPP processes), like high power impulse magnetron sputtering (HIPIMS) also known as high power pulse magnetron sputtering (HPPMS), modulated pulse power sputtering (MPP), as well as further modifications involving increased ionization in sputtering have been investigated and matured within the last decade. On European level a concerted action focusing the efforts and bringing together the leading experts was set up and is actually promoting the transition of HIPP processes to industry. Besides the well know approaches of HIPIMS/HPPMS and MPP further modifications for ionized PVD are under development. This paper focuses on HIPP processes and new technological approaches besides the well-known "big players". New approaches combining technologies like hollow cathodes in different modifications, coils for inductive coupling, arc sources for "gasless sputtering" or a modified process for constant-current HIPIMS will be presented.