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Micromachined array-type mirau interferometer for MEMS metrology

: Gorecki, C.; Bargiel, S.; Albero, J.; Passilly, N.; Kujawinska, M.; Zeitner, U.D.


Furlong, Cosme ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Interferometry XVI: Applications : 13 - 16 August 2012, San Diego, California, United States
Bellingham, WA: SPIE, 2012 (SPIE Proceedings Series 8494)
ISBN: 978-0-8194-9211-1
Art. 849403
Conference "Interferometry" <16, 2012, San Diego/Calif.>
Fraunhofer IOF ()

We present the development of an array-type micromachined Mirau interferometers, operating in the regime of low coherence interferometry (LCI) and adapted for massively parallel inspection of MEMS. The system is a combination of free-space microoptical technologies and silicon micromachining, based on the vertical assembly of two glass wafers. The probing wafer is carrying an array of refractive microlenses, diffractive gratings to correct chromatic and spherical aberrations and reference micro-mirrors. The semitransparent beam splitter plate is based on the deposition of a dielectric multilayer, sandwiched between two glass wafers. The interferometer matrix is the key element of a novel inspection system aimed to perform parallel inspection of MEMS. The fabricated demonstrator, including 5×5 channels, allows consequently decreasing the measurement time by a factor of 25. In the following, the details of fabrication processes of the micro-optical components and their as sembly are described. The feasibility of the LCI is demonstrated for the measurement of a wafer of MEMS sensors.