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Inkjet-printed diffusion barrier for structured doping areas from doped PECVD silicate glasses

: Stüwe, D.; Keding, R.; Hahn, D.; Jahn, M.; Fallisch, A.; Clement, F.; Hofmann, M.; Woehl, R.; Biro, D.; Tueshaus, C.; Doll, O.; Stockum, W.; Koehler, I.

Volltext urn:nbn:de:0011-n-2365935 (856 KByte PDF)
MD5 Fingerprint: 3a7692ac44add140d67a2d46d38c38a2
Erstellt am: 4.5.2013

Nowak, S. ; European Commission:
27th European Photovoltaic Solar Energy Conference and Exhibition, EU PVSEC 2012. DVD-ROM : Proceedings of the international conference held in Frankfurt, Germany, 24 - 28 September 2012
München: WIP-Renewable Energies, 2012
ISBN: 3-936338-28-0
European Photovoltaic Solar Energy Conference and Exhibition (EU PVSEC) <27, 2012, Frankfurt>
Konferenzbeitrag, Elektronische Publikation
Fraunhofer ISE ()
PV Produktionstechnologie und Qualitätssicherung; Silicium-Photovoltaik; Produktionsanlagen und Prozessentwicklung

This paper presents a novel approach for the formation of separated doped areas, where the diffusion barrier isishape® SolarResist is inkjet-printed prior to a plasma-enhanced chemical vapor deposition (PECVD) process of boron- and phosphorus-doped silicate glasses (BSG, PSG). This allows for very accurate single-sided definition of doped patterns without the use of masking and etching of diffusion barriers, diffusion sources or diffused areas. The printed patterns themselves are characterized regarding their thickness. The areas with the printed diffusion barrier are characterized with respect to their sheet resistance Rsh and their doping profile. The barrier effect was demonstrated for diffusion plateau times up to 30 min at 1050°C against diffusion from BSG-layers and for the same plateau time at 850°C against diffusion from PSG-layers.