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Hybrid antireflective coating with plasma-etched nanostructure

: Schulz, Ulrike; Munzert, Peter; Rickelt, Friedrich; Kaiser, Norbert


Thin solid films 532 (2013), S.119-122
ISSN: 0040-6090
International Conference on Coatings on Glass and Plastics (ICCG) <9, 2012, Breda>
Zeitschriftenaufsatz, Konferenzbeitrag
Fraunhofer IOF ()
anti-reflection; nanostructure; plasma-etching; organic layer; physical vapor deposition

Antireflective structures with features of sub-wavelength size are appropriate as an alternative to interference coatings for obtaining antireflective properties on optical surfaces. For broadband antireflection or a wide range of incidence angles, a distinct structure depth together with a very low lateral structure size is required, which is difficult to realize. Design considerations show that also thinner nanostructured layers are useful if they are combined with compact interference layers. A nanostructured low-index melamine layer has been prepared by plasma-etching of a vacuum deposited organic thin film. In combination with homogeneous silica layers antireflection properties for a broad range of light incidence angles were achieved.