
Publica
Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten. Novel industrial atmospheric pressure dry texturing procress for silicon solar cell improvement
| Nowak, S. ; European Commission: 27th European Photovoltaic Solar Energy Conference and Exhibition, EU PVSEC 2012. DVD-ROM : Proceedings of the international conference held in Frankfurt, Germany, 24 - 28 September 2012 München: WIP-Renewable Energies, 2012 ISBN: 3-936338-28-0 S.1825-1828 |
| European Photovoltaic Solar Energy Conference and Exhibition (EU PVSEC) <27, 2012, Frankfurt> |
|
| Englisch |
| Konferenzbeitrag |
| Fraunhofer IWS () |
| dry etching; silicon solar cell; texturisation; atmospheric pressure |
Abstract
The front texture of crystalline silicon solar cells plays a crucial role in order to effectively harvest light and transform it into electricity. In this paper, a novel technology based on dry atmospheric pressure etching is presented. It allows the single-sided inline etching of c-Si wafers using the global warming potential-free process gas fluorine (F2). Vast improvements of light trapping are already achieved leading to weighted reflection values below 8% without dielectric anti-reflection coating. The passivation of the relatively rough surfaces can most effectively be facilitated using ALD-Al2O3 films stacked with PECVD-SiNx layers. The paper presents SEM images of the surface structures and the basic setup principle of the new production tool.