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Reactive HIPIMS sputter deposition of alumina from industrial size rotables

 
: Gerdes, H.

Society of Vacuum Coaters -SVC-, Albuquerque/NM:
Society of Vacuum Coaters. 55th Annual SVC Technical Conference 2012 : April 28-May 3, 2012; Santa Clara, Calif.; Proceedings
Albuquerque: SVC, 2012
ISBN: 978-1-878068-32-3
ISBN: 1-878068-32-6
S.131-133
Society of Vacuum Coaters (Annual Technical Conference) <55, 2012, Santa Clara/Calif.>
Englisch
Konferenzbeitrag
Fraunhofer IST ()

Abstract
Besides application in cutting tools, alumina coatings are used as insulator for electric and sensor application. For this application it is most important to produce defect-free films with a high breakdown voltage. Up to now this is mostly done by RF sputtering of an alumina target which leads to very low deposition rates. To overcome this problem, reactive sputtering from an aluminium target in an oxygen/argon atmosphere is investigated. HIPIMS offers a tool for tailoring the film properties beyond the state of the art. Currently, research focuses increasingly on development for industrial processes. Since planar targets are dealing with a fairly large poisoned area, the possibility for arcs is increased which leads to more defects in the film and therefore causes lower breakdown voltages. This drawback should be minimized or even fully suppressed by using cylindrical cathodes, since nearly the whole surface is sputtered.

: http://publica.fraunhofer.de/dokumente/N-229167.html