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Resonant metamaterials for contrast enhancement in optical lithography

 
: Dobmann, S.; Shyroki, D.; Banzer, P.; Erdmann, A.; Peschel, U.

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Postprint (PDF; )

Optics Express 20 (2012), Nr.18, S.19928-19935
ISSN: 1094-4087
Englisch
Zeitschriftenaufsatz, Elektronische Publikation
Fraunhofer IISB ()

Abstract
The transmission through ultra-thin metal films is noticeable and thus limits their potential for the formation of lithographic masks. By sub-wavelength patterning of a metal film with a post structure, a resonant metamaterial is formed, which can effectively suppress the transmission. Measurements as well as calculations identify the width of the metal islands as a critical geometrical feature. Hence, the extraordinarily low transmission effect can be explained by the resonant response of single scatterers known as Localized Surface Plasmon Resonances (LSPR). A potential application of this suppressed transmission effect to thin metal masks in optical lithography is experimentally investigated.

: http://publica.fraunhofer.de/dokumente/N-223363.html