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Pulse Magnetron Sputtering with High Power Density-Process and Film Properties

 
: Frach, P.; Gottfried, C.; Fietzke, F.; Klostermann, H.; Bartzsch, H.; Gloess, D.

Society of Vacuum Coaters -SVC-, Albuquerque/NM:
Society of Vacuum Coaters. 55th Annual SVC Technical Conference 2012 : April 28-May 3, 2012; Santa Clara, Calif.; Proceedings
Albuquerque: SVC, 2012
ISBN: 978-1-878068-32-3
ISBN: 1-878068-32-6
S.134-138
Society of Vacuum Coaters (Annual Technical Conference) <55, 2012, Santa Clara/Calif.>
Englisch
Konferenzbeitrag
Fraunhofer FEP ()

Abstract
In this paper specific advantages and disadvantages of different
pulse magnetron sputtering processes (unipolar and
bipolar pulse sputtering at high and very high power density
including HIPIMS) as well as current and potential fields
of application will be discussed. On the examples of Ti and
TiO2 the typical effects and their influence on film properties
occurring during the transition from classical medium
frequency pulse magnetron sputtering to high energy pulse
sputtering (HIPIMS) and the influence on film properties
will be described. The discharge current density was varied
between 0.2 and 3.5 A/cm2. Aspects of energy feed-in, magnetron
design and methods of reactive process control in the
transition mode will be considered. Ideas for upscaling of the
HIPIMS process will be discussed. Furthermore the influence
of increasing ionisation on the occurrence of crystalline phases and on mechanical, optical and photocatalytic properties of the layers will be presented.

: http://publica.fraunhofer.de/dokumente/N-223080.html