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Development of tolerances for microsystems on the example of plasma deposited surfaces

 
: Westkämper, E.; Schöbel, J.; Gottwald, B.; Sommadossi, S.-A.

European Society for Precision Engineering and Nanotechnology -EUSPEN-:
4th EUSPEN International Conference 2004. Proceedings : May 31st - June 2nd, 2004, Glasgow, Scotland, UK
Scotland, UK, 2004
ISBN: 1-86194-108-0
S.352-353
European Society for Precision Engineering and Nanotechnology (International Conference) <4, 2004, Glasgow>
Englisch
Konferenzbeitrag
Fraunhofer IPA ()
Nanomeßtechnik; Mikrosystem; Fertigungsprozeß; Plasmaspritzen; Toleranz

Abstract
Production processes with accuracies in the range down to the nanometer scale gain growing importance in industry. A crucial requirement for their economical application is capable and controlled processes. These in turn are dependent on suitable measurement devices and strategies. Though measurement devices with the required precision are available, strategies and tolerance systems in the considered dimensions do not exist. In this paper an approach to the development of tolerance systems for microsystems is presented using the example of sputtered copper films and atomic force microscopy.

: http://publica.fraunhofer.de/dokumente/N-22237.html