Abstract
This paper presents the investigations on application of solid phase crystallisation (SPC) and rapid thermal annealing (RTA) processes on crystalline silicon on glass (CSG) material in a movable two sided halogen lamp oven. We show that a two sided, halogen lamp heated, movable oven bares the possibility of applying spatial as well as temporal temperature gradients along and even throughout the sample. With this technique, steep temperature profiles and different temperatures at the glass and the Si side of a sample are possible. We have been able to process samples at temperatures of more than 1160 °C very successfully. Both SPC and RTA processes have been introduced and first results will be shown. Keywords: c-Si-thin-films, halogen lamp, RTA, SPC