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Application of spatial light modulators for microlithography

: Dauderstädt, U.; Dürr, P.; Karlin, T.; Schenk, H.; Lakner, H.


Urey, H. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
MOEMS display and imaging systems II : 26 - 27 January 2004, San Jose, California, USA
Bellingham/Wash.: SPIE, 2004 (SPIE Proceedings Series 5348)
ISBN: 0-8194-5256-4
Conference on MOEMS Display and Imaging Systems <2004, San Jose/Calif.>
Fraunhofer IPMS ()
optical MEMS; spatial light modulator; DUV

The Fraunhofer IPMS and Micronic Laser Systems AB have developed a technology for the maskless DUV microlithography using spatial light modulation (SLM). This technology uses an array of micromirrors as a proprogrammable mask, which allows writing up to 1 million pixels with a framerate of up to 2 kHz. The SLM is fabricated at the IPMS using its high-voltage CMOS process. The mirrors are fabricated by surface micromachining using a polymer as sacrificial layer. The mirrors are operated in an analog mode to allow sub-pixel placement of the features.