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Hafnium titanium silicate high-k dielectric films deposited by MOCVD using novel single source precursors
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2003
Conference Paper
Titel
Hafnium titanium silicate high-k dielectric films deposited by MOCVD using novel single source precursors
Author(s)
Zürcher, S.
Morstein, M.
Lemberger, M.
Bauer, A.J.
Hauptwerk
Chemical vapor deposition XVI and EUROCVD 14. Vol.2
Konferenz
International Conference on Chemical Vapor Deposition 2003
EUROCVD 2003
Electrochemical Society (Meeting) 2003
Language
English
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Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB