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Upper roughness limitations on the TIS/RMS relationship

: Stover, John; Schröder, Sven; Duparré, Angela; Germer, Thomas A.


Hanssen, Leonard M. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Reflection, Scattering, and Diffraction from Surfaces III : 13 - 16 August 2012, San Diego, California, USA
Bellingham, WA: SPIE, 2012 (Proceedings of SPIE 8495)
ISBN: 978-0-8194-9212-8
Paper 849503
Conference "Reflection, Scattering, and Diffraction from Surfaces" <3, 2012, San Diego/Calif.>
Fraunhofer IOF ()
TIS roughness limit; BRDF; sinusoidal diffraction

The relationship between total integrated scatter and rms roughness was developed in the radar literature and enabled the first use of scatter measurements to monitor optical roughness. This relationship has been used and misused ever since. Its most common form makes use of a smooth surface approximation and has been applied to optical surfaces now for half a century. It has been suggested that Davies' exponential form can be applied to much rougher surfaces. This paper investigates that issue through a combination of approximate and rigorous calculations made on optically deep sinusoidal gratings and a few measurements.