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High performance dielectric diffraction gratings for space applications

: Zeitner, Uwe D.; Fuchs, Frank; Kley, Ernst-Bernhard


Ramón Navarro (Ed.); Colin R. Cunningham (Ed.); Eric Prieto (Ed.) ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Modern Technologies in Space- and Ground-based Telescopes and Instrumentation II : 1.-6.7.2012, Amsterdam, Netherlands
Bellingham, WA: SPIE, 2012 (Proceedings of SPIE 8450)
ISBN: 978-0-8194-9151-0
Paper 84502Z
Conference "Modern Technologies in Space- and Ground-based Telescopes and Instrumentation" <2, 2012, Amsterdam>
Fraunhofer IOF ()
grating; spectrometer; effective index structure; e-beam lithography; Sentinel-4; GAIA satellite

Modern electron beam lithography is a suitable technology for the fabrication of high performance gratings for spectroscopic applications. Due to a significant improved accuracy of the lithographic exposure the resulting gratings do show a very high wave-front quality, low stray-light, and grating ghosts. The high resolution accessible with e-beam writing can be used for sub-period engineering of the grating pattern in order to optimize the efficiency performance of the devices. This is demonstrated by different examples of pure dielectric reflection and transmission gratings developed for space missions. One is the Sentinel-4 earth observation mission; the second is the astrometry satellite GAIA of the ESA.