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Characterization of CMOS programmable multi-beam blanking arrays as used for programmable multi-beam projection lithography and resistless nanopatterning

: Eder Kapl, S.; Loeschner, H.; Piller, W.; Witt, M.; Pilz, W.; Letzkus, F.; Jurisch, M.; Irmscher, M.; Platzgummer, E.


Journal of micromechanics and microengineering 21 (2011), Nr.4, Art. 045038, 8 S.
ISSN: 0960-1317
ISSN: 1361-6439
Fraunhofer ISIT ()

Multi-beam projection lithography and resistless direct nanopatterning techniques provide decisive advantages compared to existing single electron and ion beam tools. Aperture plate systems (APS) including CMOS addressable programmable blanking arrays serve as pattern generators within these tools. An APS test stand was designed to achieve 0.08 µrad for measuring lateral/angular beamlet movements. For CMOS programmable APS units, providing 43 000 programmable beams, nearest-neighbour cross talk measurements have shown 5.5 µrad influence. This is well below the target spec for the charged particle multi-beam projection technology.