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Photon Management Structures Based on Interference Lithography

White Paper
: Bläsi, B.; Hauser, H.; Walk, C.; Michl, B.; Kübler, V.; Wolf, A.J.

Volltext urn:nbn:de:0011-n-2125917 (693 KByte PDF)
MD5 Fingerprint: 21f1932b7553ffbd05438e238c39cecf
Erstellt am: 10.4.2014

Future Photovoltaics. Online journal (Nicht mehr online verfügbar) 6 (2011)
Zeitschriftenaufsatz, Elektronische Publikation
Fraunhofer ISE ()
Solarthermie und Optik; Angewandte Optik und funktionale Oberflächen; Mikrostrukturierte Oberflächen

Since micro- and nanostructures for photon management are of increasing importance in novel high-efficiency solar cell concepts, structuring techniques with up-scaling potential play a key role in their realization. Interference lithography and Nanoimprint processes are presented as technologies for origination and replication of fine-tailored photonic structures on large areas. The combination of these processes is presented as feasible route to generate high efficiency honeycomb textures on multicrystalline silicon.