Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.

Inkjet printing for high definition industrial masking processes for solar cell production

Presented at 17th International Photovoltaic Science and Engineering Conference Dec. 3-7, 2007, Fukuoka, Japan
: Biro, D.; Erath, D.; Belledin, U.; Specht, J.; Stüwe, D.; Lemke, A.; Aleman, M.; Mingirulli, N.; Rentsch, J.; Preu, R.; Schlosser, R.; Bitnar, B.; Neuhaus, H.

Volltext urn:nbn:de:0011-n-2094785 (219 KByte PDF)
MD5 Fingerprint: 811e0138539f7df56f7463f6fb8c7b31
Erstellt am: 28.11.2012

2007, 2 S.
International Photovoltaic Science and Engineering Conference (PVSEC) <17, 2007, Fukuoka>
Vortrag, Elektronische Publikation
Fraunhofer ISE ()

Transferring high efficiency concepts from lab scale photolithography based processes into industrial scale requires adequate technologies for structuring silicon, dielectrics and metals avoiding costly and slow photolithography processes. Here we present high throughput ink-jetting of special pastes which serve e.g. as barriers against HF in structuring steps. Ink-jet technology is also used in order to create layers for cheap and fast lift-off processes. Various structuring steps are presented in this paper and examples for created structures are shown. Results are shown for the application of the processes for nickel plating and lift-off respectively. Subsequently the wafers can be processed in a inline plating unit to create highly conductive silver fingers on top of the deposited seed layers