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High-performance Cr/Sc multilayers for the soft X-ray range

 
: Yulin, S.; Schäfers, F.; Feigl, T.; Kaiser, N.

:

Khounsary, A.M. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Advances in mirror technology for x-ray, EUV lithography, laser, and other applications : 7 - 8 August 2003, San Diego, California, USA. Papers presented at the Conference on Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications held as part of the 48th annual meeting of SPIE's International Symposium on Optical Science and Technology
Bellingham/Wash.: SPIE, 2004 (SPIE Proceedings Series 5193)
ISBN: 0-8194-5066-9
S.172-176
Conference on Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications <2003, San Diego/Calif.>
International Symposium on Optical Science and Technology <48, 2003, San Diego/Calif.>
Englisch
Konferenzbeitrag
Fraunhofer IOF ()

Abstract
Results of soft x-ray reflection measurements of Cr/Sc multilayer mirrors close to the Sc absorption edge at 3.11 nm are presented. Improvements in the deposition technology and the adjustment of the multilayer period with an accuracy of better than 0.01 nm to this absorption edge enabled a step forward towards soft x- ray mirrors with an adequate reflectance that allow the realization of normal incidence optical components in the water window. In particular, reflectivity measurements performed at the PTB reflectometer at BESSY II in Berlin revealed a reflectivity of R = 14.8% at an incidence angle of diameter = 1.5° and R = 15.0% at diameter = 5°. Simulation results show that the interface widths between the Cr and Sc nanolayers are less than 0.4 nm. The annealing effect in short-period Cr/Sc multilayers was studied in the temperature range from 50°C to 500°C by X-ray scattering and transmission electron microscopy. Structural and phase transformatio ns and the corresponding changes of the optical properties are presented and dis cussed.

: http://publica.fraunhofer.de/dokumente/N-20947.html