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Electrolytic nickel deposition for the front side metallization of silicon solar cells

: Bay, N.; Radtke, V.; Aleman, M.; Bartsch, J.; Glunz, S.W.

Volltext urn:nbn:de:0011-n-2094647 (223 KByte PDF)
MD5 Fingerprint: 678af5939c94362b1e9676f234796541
Erstellt am: 15.8.2012

Sinke, W. ; WIP - Renewable Energies, München; European Commission; UNESCO; World Council for Renewable Energy; International Photovoltaic Equipment Association:
24th European Photovoltaic Solar Energy Conference 2009. CD-ROM : The compiled State-of-the-Art of PV Solar Technology and Deployment. Proceedings of the International Conference held in Hamburg, 21-25 September 2009
München, 2009
ISBN: 3-936338-25-6
European Photovoltaic Solar Energy Conference and Exhibition (EU PVSEC) <24, 2009, Hamburg>
Konferenzbeitrag, Elektronische Publikation
Fraunhofer ISE ()

In this work the formation of a nickel seed layer for the front side metallization of silicon solar cells based on light induced plating (LIP) is presented. Nickel is plated from a Nickel Watts electrolyte. The influence of LIP parameters like the intensity of the incident light and the applied potential to the rear side of the solar cell has been investigated. After generating the nickel seed layer the contacts were thickened by a cyanide-free silver LIP step. First promising results were obtained producing industrial solar cells with a cell efficiency of 16.8 %.