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Optical performance of LPP multilayer collector mirrors

: Feigl, Torsten; Perske, Marco; Pauer, Hagen; Fiedler, Tobias; Yulin, Sergiy; Trost, Marcus; Schroeder, Sven; Duparré, Angela; Kaiser, Norbert; Tünnermann, Andreas; Böwering, Norbert; Ershov, Alex; Hoffmann, Kay; La Fontaine, Bruno; Cummings, Kevin D.


Naulleau, P.P. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Extreme Ultraviolet (EUV) Lithography III : February 2012, San Jose, California, USA
Bellingham, WA: SPIE, 2012 (Proceedings of SPIE 8322)
ISBN: 978-0-8194-8978-4
Paper 832217
Conference "Extreme Ultraviolet (EUV) Lithography" <3, 2012, San Jose/Calif.>
Fraunhofer IOF ()
EUV source; EUV collector mirror; multilayer mirror coating; collector lifetime; optics lifetime; roughness; light scattering; power spectral density; HSFR

The usable power and the collector optics lifetime of high-power extreme ultraviolet light sources at 13.5 nm are considered as the major challenges in the transitioning of EUV lithography from the current pre-production phase to high volume manufacturing. We give a detailed performance summary of the large ellipsoidal multilayer collector mirrors used in Cymer's laser-produced plasma extreme ultraviolet light sources. In this paper we present the optical performance - reflectance and wavelength - of the multilayer-coated ellipsoidal collectors as well as a novel approach for the roughness characterization of large EUV mirror optics based on light scattering measurements at 442 nm. We also describe the optical performance and characteristics during operation of the light source and the substantial increase of collector lifetime by the implementation of new coating designs.