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Prediction of wafer homogeneity maps using a virtual metrology scheme consisting of time resolved OES measurements and a neural network

 
: Zimmermann, S.; Reich, R.; Zacher, M.; Schulz, S.E.; Gessner, T.

Silicon Saxony e.V.:
11th European Advanced Equipment Control/Advanced Process Control Conference, AEC/APC 2011 : Dresden, Germany, 4 - 6 April 2011
Red Hook, NY: Curran, 2011
ISBN: 978-1-61839-085-1
S.543-548
European Advanced Equipment Control/Advanced Process Control Conference (AEC/APC) <11, 2011, Dresden>
Englisch
Konferenzbeitrag
Fraunhofer ENAS ()

: http://publica.fraunhofer.de/dokumente/N-199040.html