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Advanced APCVD-processes for high-temperature grown crystalline silicon thin film solar cells

: Driessen, M.; Merkel, B.; Reber, S.


Journal of nanoscience and nanotechnology 11 (2011), Nr.9, S.8174-8179
ISSN: 1533-4880
Fraunhofer ISE ()
Materialien - Solarzellen und Technologie; Silicium-Photovoltaik; Silicium-Photovoltaik; Kristalline Silicium-Dünnschichtsolarzellen; Charakterisierung von Prozess- und Silicium-Materialien; Kristalline Silicium- Dünnschichtsolarzellen

Crystalline silicon thin film (cSiTF) solar cells based on the epitaxial wafer-equivalent (EpiWE) concept combine advantages of wafer-based and thin film silicon solar cells. In this paper two processes beyond the standard process sequence for cSiTF cell fabrication are described. The first provides an alternative to wet chemical saw damage removal by chemical vapor etching (CVE) with hydrogen chloride in-situ prior to epitaxial deposition. This application decreases the number of process and handling steps. Solar cells fabricated with different etching processes achieved efficiencies up to 14.7%. 1300 degrees C etching temperature led to better cell results than 1200 degrees C. The second investigated process aims for an improvement of cell efficiency by implementation of a reflecting interlayer between substrate and active solar cell. Some characteristics of epitaxial lateral overgrowth (ELO) of a patterned silicon dioxide film in a lab-type reactor constructed at Fraunhofer ISE are described and first solar cell results are presented.