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Iridium wire grid polarizer fabricated using atomic layer deposition

: Weber, T.; Kasebier, T.; Szeghalmi, A.; Knez, M.; Kley, E.B.; Tünnermann, A.


Nanoscale research letters : NRL 6 (2011), Art.558, 4 S.
ISSN: 1931-7573
ISSN: 1556-276X
Fraunhofer IOF ()

In this work, an effective multistep process toward fabrication of an iridium wire grid polarizer for UV applications involving a frequency doubling process based on ultrafast electron beam lithography and atomic layer deposition is presented. The choice of iridium as grating material is based on its good optical properties and a superior oxidation resistance. Furthermore, atomic layer deposition of iridium allows a precise adjustment of the structural parameters of the grating much better than other deposition techniques like sputtering for example. At the target wavelength of 250 nm, a transmission of about 45% and an extinction ratio of 87 are achieved.