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VUV light scattering measurements of substrates and thin film coatings

 
: Hultaker, A.; Gliech, S.; Benkert, N.; Duparre, A.

:

Duparre, A.; Singh, B. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Advanced characterization techniques for optics, semiconductors, and nanotechnologies : 3 - 5 August 2003, San Diego, California, USA
Bellingham/Wash.: SPIE, 2003 (SPIE Proceedings Series 5188)
ISBN: 0-8194-5061-8
S.115-122
Conference on Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies <2003, San Diego/Calif.>
Englisch
Konferenzbeitrag
Fraunhofer IOF ()
light scattering; total scattering; angle resolved scattering; reflectance; transmittance; VUV; 157 nm; optical component; CaF2

Abstract
We have developed a system that measures total and angle resolved light scattering, reflectance and transmittance at 193 nm and 157 nm. This system allows the investigation of substrates and coatings for vacuum-ultraviolet (VUV) components with high sensitivity, down to scattering levels of 1 ppm for total scatter measurement. The dynamic range of the angle resolved scatter measurement set-up exceeds 9 orders of magnitude. Methods for evaluating the quality of CaF2 substrates for low loss optical components for 157 nm are presented. By using roughness data from Atomic Force Microscopy (AFM) measurements combined with scattering measurements surface roughness as well as inhomogeneities in the bulk of the material can be studied. Results are also presented of anti-reflective (AR) and highly reflective (HR) multiplayer coatings on CaF2.

: http://publica.fraunhofer.de/dokumente/N-19829.html