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Characterizing CaF2 for VUV optical components: Roughness, surface scatter, and bulk scatter

 
: Hultaker, A.; Benkert, N.; Gliech, S.; Duparre, A.

:

Exarhos, G.J. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.; Lawrence Livermore National Laboratory; Wissenschaftliche Gesellschaft Lasertechnik -WLT-:
Laser-induced damage in optical materials 2002. Proceedings : 34th Boulder Damage Symposium, 16 - 18 September 2002, Boulder, Colorado, 7th International Workshop on Laser Beam and Optics Characterization, 18 - 19 September 2002, Boulder, Colorado
Bellingham/Wash.: SPIE, 2003 (SPIE Proceedings Series 4932)
ISBN: 0-8194-4727-7
S.444-451
International Workshop on Laser Beam and Optics Characterization (LBOC) <7, 2002, Boulder/Colo.>
Annual Boulder Damage Symposium <34, 2002, Boulder/Colo.>
Symposium on Optical Materials for High-Power Lasers <34, 2002, Boulder/Colo.>
Englisch
Konferenzbeitrag
Fraunhofer IOF ()
CaF2; atomic force microscopy; light scattering; optical coatings; VUV; 157 nm; 193 nm

Abstract
Methods for evaluating the quality of CaF2 substrates for vacuum ultraviolet (VUV) low loss optical components are presented. Today superpolished CaF2 is available. However, major differences might still occur between batches and careful control is therefore necessary. By using roughness data from AFM measurements combined with total scattering measurements at 193 nm and 157 nm surface roughness as well as inhomogeneities in the bulk of the material can be studied. Results are also presented of anti-reflective (AR) and highly reflective (HR) multilayer coatings on CaF2 where reduced total backscatter scattering was found for the AR -coating as compared to the substrate.

: http://publica.fraunhofer.de/dokumente/N-19605.html