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System for angle-resolved and total light scattering, transmittance, and reflectance measurements of optical components at 157 nm and 193 nm

: Gliech, S.; Geßner, H.; Duparre, A.


Exarhos, G.J. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.; Lawrence Livermore National Laboratory; Wissenschaftliche Gesellschaft Lasertechnik -WLT-:
Laser-induced damage in optical materials 2002. Proceedings : 34th Boulder Damage Symposium, 16 - 18 September 2002, Boulder, Colorado, 7th International Workshop on Laser Beam and Optics Characterization, 18 - 19 September 2002, Boulder, Colorado
Bellingham/Wash.: SPIE, 2003 (SPIE Proceedings Series 4932)
ISBN: 0-8194-4727-7
International Workshop on Laser Beam and Optics Characterization (LBOC) <7, 2002, Boulder/Colo.>
Annual Boulder Damage Symposium <34, 2002, Boulder/Colo.>
Symposium on Optical Materials for High-Power Lasers <34, 2002, Boulder/Colo.>
Fraunhofer IOF ()
light scattering; total scattering; angle resolved scattering; reflectance; transmittance; VUV; 157 nm; 193 nm; optical component

A system is presented that measures total and angle resolved light scattering, reflectance and transmittance at 193 nm and 157 nm. Substrates and coatings for VUV lithography components can be investigated with high sensitivity, down to scattering levels of 1ppm.