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High frequency binary amorphous silicon grating working as wire grid polarizer for UV applications

 
: Weber, Thomas; Käsebier, Thomas; Kroker, Stefanie; Kley, Ernst-Bernhard; Tünnermann, Andreas

:

Chang-Hasnain, C.J. (Ed.) ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
High Contrast Metastructures : San Francisco, California, USA, January 2012
Bellingham, WA: SPIE, 2012 (Proceedings of SPIE 8270)
ISBN: 978-0-8194-8913-5
Paper 82700F
Conference "High Contrast Metastructures" <2012, San Francisco/Calif.>
Englisch
Konferenzbeitrag
Fraunhofer IOF ()
high contrast gratings; diffraction grating; nanostructure fabrication

Abstract
In this work we present a wire grid polarizer with a working range down to 300 nm based on an amorphous silicon grating. For the fabrication of gratings with periods of 120 nm and 140 nm electron beam lithography and ICP etching were used. Furthermore the influence of the grating period on the optical properties was investigated. The measured maximum value of the extinction ratio for a period of 140 nm and 120 nm is 177 at a wavelength of 418 nm and 324 at a wavelength of 394 nm, respectively.

: http://publica.fraunhofer.de/dokumente/N-195695.html