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Particle-in-cell Monte Carlo simulation for process analysis and development

: Siemers, M.; Pflug, A.; Schwanke, C.; Szyszka, B.

Society of Vacuum Coaters -SVC-, Albuquerque/NM:
Society of Vacuum Coaters. 54th Annual Technical Conference 2011. Proceedings : April 16-21, 2011, Chicago, IL USA
Albuquerque: SVC, 2011
ISBN: 978-1-87806-831-6
Society of Vacuum Coaters (Annual Technical Conference) <54, 2011, Chicago/Ill.>
Fraunhofer IST ()

A gas flow and plasma simulation software has been implemented. The simulation approach is based on Direct Simulation Monte Carlo (DSMC) and Particle-in-Cell Monte Carlo (PIC-MC) modeling, respectively. Massive parallel processing is used to perform 3D gas flow and plasma simulations for industrial sized coater setups. Also an interface for geometry modeling has been implemented based on finite element meshes. Hence, geometry models generated with common CAD tools can be easily included. The PIC-MC/DSMC software has been implemented primarily as a virtual development and analysis tool in thin film technology. In this work we show the assignment to prototype a magnetron sputtering coater from scratch. With this sputter coater the concept of so called serial co-sputtering has been realized. Hereby one target material is sputtered onto another target, e.g. to create material compounds or increase sputter yield. Furthermore an innovative approach to achieve reactive gas separation between adjacent recipient chambers has been incorporated into coater. During the design and planning phase PIC-MC/DSMC simulations have been performed to decide about technical layout issues. These consist of shielding and gas inlet system as well as magnetron and cathode layouts. The simulation setups to investigate gas flow and gas discharge dynamics for different parameter sets are shown in this work. Simulation results helped designing a successfully running prototype and preventing any subsequent aberrations, respectively.