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Magnetically enhanced RF discharges for effective pre-treatment of plastic webs at high speed

: Rank, R.; Wünsche, V.; Günther, S.


Surface and coatings technology 174-175 (2003), S.218-221
ISSN: 0257-8972
International Conference on Plasma Surface Engineering (PSE) <8, 2002, Garmisch-Partenkirchen>
Zeitschriftenaufsatz, Konferenzbeitrag
Fraunhofer FEP ()
titanium dioxide; photocatalyst; reactive sputtering; transition region

Titanium dioxide (TiO) films were deposited on unheated non-alkali glass substrates by reactive mid-frequency (mf) magnetron 2 26 sputtering using dual cathodes with two Ti metal targets. In order to keep the very high deposition rate, the depositions were 27 carried out in the transition region between the metallic and the reactive (oxide) sputter mode where the target surface was 28 metallic and oxidized, respectively. Stable deposition was successfully carried out in the whole transition region at both total 29 pressure of 1 Pa and 3 Pa, using the plasma control units (PCU). The highest deposition rate in this study for the photocatalytic 30 TiO films deposited in the transition region was over 30 nm ymin, which was larger than that for the conventional sputter 2 31 deposition by one order of magnitude. These films could be crystallized by post-annealing in air at 200 8C. Photoinduced 32 decomposition of acetaldehyde and photoinduced hydrophilicity was successfully demonstrated.