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High average power ultrafast lasers

 
: Weitenberg, J.; Russbueldt, P.; Hoffmann, H.-D.; Poprawe, R.

:
Preprint urn:nbn:de:0011-n-1893202 (496 KByte PDF)
MD5 Fingerprint: a02d9eaf26e65577c7f222b064fcc4c5
© 2011 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE.
Erstellt am: 27.4.2012


Institute of Electrical and Electronics Engineers -IEEE-; Optical Society of America -OSA-, Washington/D.C.:
European Conference on Lasers and Electro-Optics and 12th European Quantum Electronics Conference, CLEO Europe/EQEC 2011. Vol.1 : 22 - 26 May 2011, Munich, Germany
New York, NY: IEEE, 2011
ISBN: 978-1-4577-0533-5
ISBN: 978-1-4577-0532-8
S.68
European Quantum Electronics Conference (EQEC) <12, 2011, Munich>
European Conference on Lasers and Electro-Optics (CLEO Europe) <2011, Munich>
Englisch
Konferenzbeitrag, Elektronische Publikation
Fraunhofer ILT ()

Abstract
Ultrafast lasers have found widespread applications in science and industry. In order to increase the throughput in micromachining and to reduce the measurement time in scientific applications, the average power of these laser sources needs to be increased. Ultrafast laser sources of high average power at moderate cost, high reliability and flexible repetition rate are essential for the transfer of femtosecond technology to industry.

: http://publica.fraunhofer.de/dokumente/N-189320.html