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Cross-Magnetron-Effekt und ITO-Schichtabscheidung

Cross magnetron effect and ITO film deposition
: Kupfer, H.; Richter, F.; Kleinhempel, R.; Blüthner, R.; Raubold, T.


Vakuum in Forschung und Praxis 20 (2008), Nr.1, S.28-34
ISSN: 0947-076X
ISSN: 1522-2454
Fraunhofer FEP ()

The large area deposition of TCO films requires a strictly homogeneous lateral distribution of the process parameters at the substrate position. In view of that, Cross Corner Effect (in case of a single magnetron source) and Cross Magnetron Effect (for dual magnetrons) can cause problems. Measurements confirm a distinct influence of these effects on the functional properties of indium tin oxide films. The effect will be discussed in terms of the concentration of the dissociated oxygen in the process gas, which depends on the plasma properties and the oxygen partial pressure.