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Untersuchung dünner Schichten mittels Röntgenreflektometrie

Thin film characterization by means of X-ray reflectometry
: Dietsch, R.; Holz, T.


Vakuum in Forschung und Praxis 18 (2006), Nr.5, S.22-25
ISSN: 0947-076X
ISSN: 1522-2454
Fraunhofer IWS ()

X-ray reflectometry and diffractometry are widely used non-destructive methods to characterize thin films in the total thickness range which is typically between 2nm and approximately 500nm. On special arrangements a resolution up to 1000nm layer thickness has been demonstrated. Layer stack morphology, surface topography, layer structure, material density, single layer or period thickness and surface and interface roughness are the typical structural parameters both of single layers and of multilayers which can be described by the measured data. The performance of the measurement setup is mainly influenced by the parameters of the incident X-ray beam like beam divergence, monochromatism and photon energy. In the following the influence of the optical components in the beam path to angle and energy resolution of X-ray reflectometry is discussed.