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Optical and thin film properties of mixed oxides deposited by pulsed reactive magnetron sputtering

: Bruns, S.; Vergöhl, M.


Lequime, M. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Advances in Optical Thin Films IV : SPIE Optical System Design 2011, 5.-8.9.2011, Marseille, France
Bellingham, WA: SPIE, 2011 (Proceedings of SPIE 8168)
ISBN: 978-0-8194-8794-0
Paper 81680N
Conference "Advances in Optical Thin Films" <4, 2011, Marseille>
Fraunhofer IST ()
reactive magnetron sputtering; mixed oxide; process control; optical emission spectroscopy; silica; hafnia; optical properties; thin film properties

Reactive magnetron sputtering was used to deposit optical thin films. In order to obtain high deposition rates, metallic targets were used. For the creation of mixed oxides bipolar pulsed sputtering was applied to two different targets. A new process control setup was developed to monitor the oxidation state of both targets individually. Two different elemental targets are co-sputtered in oxygen-argon atmosphere within the lambda-probe stabilized transition mode. The composition is controlled by optical emission spectroscopy. Thus different mixtures are accessible without changing target material. Varied mixtures in the system hafnia-silica have been prepared. The optical properties (refractive indices, absorption, surface roughness, density) as well as mechanical behavior (film stress, hardness) of the mixtures are compared to pure oxide materials. By mixing the oxides thin film quality can be improved beyond the properties of the single materials.