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Current voltage characteristics through grains and grain boundaries of high-k dielectric thin films measured by tunneling atomic force microscopy

 
: Murakami, Katsuhisa; Rommel, Mathias; Yanev, Vasil; Bauer, Anton J.; Frey, Lothar

:

Seiler, D.G. ; American Institute of Physics -AIP-, New York:
Frontiers of Characterization and Metrology for Nanoelectronics 2011 : Grenoble (France), 23-26 May 2011
New York, N.Y.: AIP Press, 2011 (AIP Conference Proceedings 1395)
ISBN: 978-0-7354-0965-1
ISBN: 978-0-7354-0973-6
ISSN: 0094-243X
S.134-138
International Conference on Frontiers of Characterization and Metrology for Nanoelectronics <2011, Grenoble>
Englisch
Konferenzbeitrag
Fraunhofer IISB ()
dielectric thin films; grain boundary; atomic force microscopy; conductive AFM; TUNA

: http://publica.fraunhofer.de/dokumente/N-185760.html