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Methology to evaluate light scatter mechanisms of VUV substrates and coatings

 
: Duparre, A.; Gliech, S.; Hultaker, A.

Instruments and Standard Test Procedures for Laser Beam and Optics Characterization. Abschlußbericht zum Projekt "CHOCLAB II"
Düsseldorf: VDI Technologiezentrum, 2003
S.223-232
Englisch
Aufsatz in Buch
Fraunhofer IOF ()
CaF2; SiO2; atomic force microscopy; light scattering; surface scatter; volume scatter; optical coating; DUV; VUV; 157 nm; 193 nm

Abstract
Methods for evaluating the quality of CaF2 and SiO2 substrates for deep-ultraviolet (DUV) and vacuum-ultraviolet (VUV) low loss optical components are presented. Today even superpolished CaF2 is available. However, major differences mights till occur between batches and careful control is therefore necessary. By using roughness data from AFM measurements combined with scattering measurements at 19 3 nm and. 157 nm surface roughness as well as in inhomogeneities in the bulk of the material can be studied. Results are also presented of anti-reflective (AR) and highly reflective (HR) multilayer coatings on CaF2 where reduced total back scatter scattering was found for the AR-coating as compared to the substrate.

: http://publica.fraunhofer.de/dokumente/N-18394.html