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Contamination control during substrate handling

 
: Bürger, Frank

Wertz, R. ; Fraunhofer-Institut für Produktionstechnik und Automatisierung -IPA-, Stuttgart:
1. Workshop "Handling and Automation of Solar Wafer and Cells" 2011. CD-ROM : Stuttgart, 13th January 2011
Stuttgart, 2011
17 Folien
Workshop on Handling and Automation of Solar Wafer and Cells <1, 2011, Stuttgart>
Seminar Handhabung und Automatisierung in der Photovoltaik <2011, Stuttgart>
Englisch
Konferenzbeitrag
Fraunhofer IPA ()
handling; contamination control; handling of substrate; particle; clean design; Kontamination; Teilchen; Substrat; Handhaben

Abstract
Contamination control during substrate handling is important because of the contamination potential of the automation components in production environments. The automation components cause particle emission and need therefore a suitable design. The gripping elements causing often particles on substrates. Inline surface particle measurements systems can help to improve production yield.

: http://publica.fraunhofer.de/dokumente/N-183377.html