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Optimized wetting behavior of water-based cleaning solutions for plasma etch residue removal by application of surfactants

 
: Ahner, N.; Zimmermann, S.; Schaller, M.; Schulz, S.E.

10th International Symposium on Ultra Clean Processing of Semiconductor Surfaces, UCPSS 2010. Proceedings : Ostende (Belgium); 2010 Sep 20-22
Ostende, 2010
S.48-49
International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS) <10, 2010, Ostende>
Englisch
Konferenzbeitrag
Fraunhofer ENAS ()

: http://publica.fraunhofer.de/dokumente/N-177638.html