English
Deutsch
Log In
Password Login
or
Log in with Fraunhofer Smartcard
Research Outputs
Projects
Researchers
Institutes
Statistics
Fraunhofer-Gesellschaft
Home
Fraunhofer-Gesellschaft
Konferenzschrift
Optimized wetting behavior of water-based cleaning solutions for plasma etch residue removal by application of surfactants
Details
Full
Export
Statistics
Options
2010
Conference Paper
Titel
Optimized wetting behavior of water-based cleaning solutions for plasma etch residue removal by application of surfactants
Author(s)
Ahner, N.
Zimmermann, Sven
Schaller, M.
Schulz, Stefan E.
Hauptwerk
10th International Symposium on Ultra Clean Processing of Semiconductor Surfaces, UCPSS 2010. Proceedings
Konferenz
International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS) 2010
Language
English
google-scholar
View Details
Fraunhofer-Institut für Elektronische Nanosysteme ENAS