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Checkerboard pattern for PSF parameter determination in electron beam lithography

: Gutsch, M.; Choi, K.-H.; Freitag, M.; Hauptmann, M.; Hohle, C.; Jaschinsky, P.; Keil, K.


Behringer, U.F.W. ; VDE/VDI-Gesellschaft Mikroelektronik, Mikro- und Feinwerktechnik -GMM-; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
26th European Mask and Lithography Conference : 18 - 20 January 2010, Grenoble, France
Bellingham, WA: SPIE, 2010 (Proceedings of SPIE 7545)
ISBN: 978-0-8194-7941-9
Paper 754507
European Mask and Lithography Conference (EMLC) <26, 2010, Grenoble>
Fraunhofer CNT ()

In electron beam lithog., the electron scattering and the corresponding proximity effect highly influence the feature resoln. Esp. for sub-100 nm features a compensation for this effect is needed. There are several methods of detn. of the proximity parameters, which mostly are time-consuming and complex due to a need of an initial proximity effect correction and immense measurement effort. In this paper the checkerboard pattern is proposed to provide the opportunity for proximity parameter detn. in a fast and easy manner without using a sophisticated CD-SEM metrol. The concept is illustrated by simulation, physicochem. and first exptl. results are shown.