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Cleaning of nanopillar templates for nanoparticle collection using PDMS

: Merzsch, S.; Wasisto, H.S.; Waag, A.; Kirsch, I.; Uhde, E.; Salthammer, T.; Peiner, E.


Rodríguez-Vázquez, A.B. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Bioelectronics, biomedical, and bioinspired systems V, and nanotechnology V : 18 - 20 April 2011, Prague, Czech Republic
Bellingham, WA: SPIE, 2011 (Proceedings of SPIE 8068)
ISBN: 978-0-8194-8657-8
ISSN: 0038-7355
Paper 806819
Conference "Bioelectronics, Biomedical, and Bioinspired Systems" <5, 2011, Prague>
Conference "Nanotechnology" <5, 2011, Prague>
Fraunhofer WKI ()

Nanoparticles are easily attracted by surfaces. This sticking behavior makes it difficult to clean contaminated samples. Some complex approaches have already shown efficiencies in the range of 90%. However, a simple and cost efficient method was still missing. A commonly used silicone for soft lithography, PDMS, is able to mold a given surface. This property was used to cover surface-bonded particles from all other sides. After hardening the PDMS, particles are still embedded. A separation of silicone and sample disjoins also the particles from the surface. After this procedure, samples are clean again. This method was first tested with carbon particles on Si surfaces and Si pillar samples with aspect ratios up to 10. Experiments were done using 2 inch wafers, which, however, is not a size limitation for this method.