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Nanofocusing refractive X-ray lenses: Fabrication and modeling

: Boye, P.; Feldkamp, J.M.; Patommel, J.; Schwab, A.; Stephan, S.; Hoppe, R.; Schroer, C.G.; Burghammer, M.; Riekel, C.; Hart, A. van der; Küchler, M.

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Journal of physics. Conference series 186 (2009), Art. 012063
ISSN: 1742-6588
ISSN: 1742-6596
Zeitschriftenaufsatz, Elektronische Publikation
Fraunhofer IZM ()

Nanofocusing refractive X-ray lenses (NFLs) form the basis of a hard X-ray scanning microscope. They are characterized by their short focal length ( 10 mm at 15 keV to 25 keV) and large numerical aperture, allowing for the generation of hard X-ray nanobeams even at short distances from a synchrotron radiation source. These optics, made out of silicon by electron beam lithography and subsequent deep reactive ion etching, have been shown to focus hard x-rays down to 50 nm. We have modeled these optics, allowing us to characterize slight aberrations and the wave-field properties in the focus by analyzing the beam profile in the far field.