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ZnO:Al films for a-Si:H thin film solar cells

: Szyszka, B.; Sittinger, V.; Ruske, F.; Werner, W.; Pflug, A.; Rech, B.

Society of Vacuum Coaters -SVC-, Albuquerque/NM:
Society of Vacuum Coaters. 48th Annual Technical Conference 2005. Proceedings : April 23 - 28, 2005, Denver, Colorado, USA
Albuquerque: SVC, 2005
Society of Vacuum Coaters (Annual Technical Conference) <48, 2005, Denver/Colo.>
Fraunhofer IST ()

We report on transparent and conductive ZnO:Al films deposited by reactive AC magnetron sputtering for large area a-Si:H thin film solar cells. Up to now, the highest efficiency of a-Si:H thin film solar cells has been achieved using ceramic ZnO:Al2O3 target material. We have developed the reactive AC magnetron sputtering for the large area in-line deposition of ZnO:Al films on glass substrates as a competitive high rate and low cost technology. These films with minimum resistivity of 260 (A Wem allow for reproducible initial cell efficiencies of more than 9% for single junction amorphous silicon solar cells on commercial float glass substrates.