Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.

Piezoresistive effect in DLC films and silicon

 
: Tibrewala, A.; Phataralaoha, A.; Peiner, E.; Bandorf, R.; Büttgenbach, S.

Laudon, M. ; Nano Science and Technology Institute -NSTI-:
NSTI Nanotechnology Conference and Trade Show. NSTI Nanotech 2007. Vol.3 : Santa Clara, May 20 - 24, 2007; An interdisciplinary integrative forum on nanotechnology, biotechnology and microtechnology; Includes: 2007 NSTI Bio Nano Conference and Trade Show, Bio Nano 2007, 10th International Conference on Modeling and Simulation of Microsystems, MSM 2007, 7th International Conference on Computational Nanoscience and Technology, ICCN 2007, 6th Workshop on Compact Modeling, WCM 2007, NSTI Nanotech Ventures 2007, Nanotech for Investors 4th Bi-Annual Summit, 2007 TechConnect Summit, 2007 Cleantech Conference, Venture Forum and Trade Show, Cleantech 2007; Technical proceedings
Cambridge, Mass. [u.a.]: NSTI, 2007
ISBN: 1-4200-6342-1
ISBN: 978-1-4200-6342-4
S.17-20
Nanotechnology Conference and Trade Show (Nanotech) <2007, Santa Clara/Calif.>
Englisch
Konferenzbeitrag
Fraunhofer IST ()

Abstract
Hydrogenated amorphous diamond-like carbon (DLC, a-C:H) films were integrated in silicon boss membrane as a strain gauge material. The films were deposited at a bias voltage of -800 V by plasma-assisted chemical vapour deposition (PACVD). The a-C:H film with a 12-13 % of hydrogen showed hardness of 23 GPa. The film has around 24 % of sp3 content. The I-V characteristic is found to be Ohmic and the film has activation energy of around 0.32 eV. High gauge factor (K) values in the range of 16-36 were obtained, which were found to be independent of longitudinal and transversal strain configurations, current injection direction and of temperature in the range of 22-45 °C. P-diffused strain gauges using Borofilm 100 were also integrated in the boss membrane. High sensitivities in the range of 0.33-0.63 mV/V/mN were obtained, when vertical load was applied on the boss membrane.

: http://publica.fraunhofer.de/dokumente/N-172339.html